Archive: September, 2012

C. Edwards, A. Arbabi, G. Popescu, and L. Goddard, Optically monitoring and controlling nanoscale topography during semiconductor etching, Nature-Light: Science & Applications, 1, e30 (2012).

Posted on 09/28/12 by Taewoo

PDF Link We present epi-diffraction phase microscopy (epi-DPM) as a non-destructive optical method for monitoring semiconductor fabrication processes in real time and with nanometer level sensitivity. The method uses a compact Mach–Zehnder interferometer to recover quantitative amplitude and phase maps of the field reflected by the sample. The low temporal noise of 0.6 nm per […]

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