C. Edwards, A. Arbabi, G. Popescu, and L. Goddard, Optically monitoring and controlling nanoscale topography during semiconductor etching, Nature-Light: Science & Applications, 1, e30 (2012).

C. Edwards, A. Arbabi, G. Popescu, and L. Goddard, Optically monitoring and controlling nanoscale topography during semiconductor etching, Nature-Light: Science & Applications, 1, e30 (2012).

PDF Link We present epi-diffraction phase microscopy (epi-DPM) as a non-destructive optical method for monitoring semiconductor fabrication processes in real...